On August 30th, Ai Siqiang said that Japan's Showa Denko added a set of hot-walled silicon carbide chemical vapor deposition planetary reactors based on its existing Ai Siqiang equipment. The chemical vapor deposition (CVD) system can process 10 100mm silicon wafers or 6 150mm wafers simultaneously, and will be applied to a range of power electronics applications and component types (such as solar power modules, AC/DC converters, and industrial motor control). Inverter system) grows a homoepitaxial material on a silicon carbide (SiC) substrate.
Through the application of the new system, Showa Denko will increase the production of existing wafers with a diameter of 100mm and expand to the production of larger diameter 150mm silicon carbide wafers, enabling the production of larger wafers to reduce costs. At the same time increase market acceptance.
Ai Siqiang said that their system is designed to further promote economies of scale by reducing the wafer edge exclusion zone and increasing the monolithic wafer usage of larger diameter substrates. The appeal of silicon carbide in this type of application stems from its unique materials, such as high critical electric field strength, which allows high breakdown voltage and low on-resistance. The greater advantage of silicon carbide in power applications is its high thermal conductivity and high heat resistance.
Ai Siqiang has developed a special reaction chamber for this state-of-the-art production system platform, which can withstand the high temperature of 1650 °C required for the epitaxial process of silicon carbide wafers. In the epitaxial process, each of the six 150 mm wafers processed by the Acetron system will undergo a "planetary" rotation, demonstrating the most advanced uniformity and repeatability of the technology.
The reason why Showa Denko chose Aisin hot wall silicon carbide chemical vapor deposition planetary system is to use Ai Siqiang's rich experience and expertise in this area, and expand its business scope through cost-effective 150mm silicon carbide wafers. . Showa Denko sees the rapid emergence of silicon carbide related products in the consumer electronics market and its future prospects in the railway power processing and automation market.
Through the application of the new system, Showa Denko will increase the production of existing wafers with a diameter of 100mm and expand to the production of larger diameter 150mm silicon carbide wafers, enabling the production of larger wafers to reduce costs. At the same time increase market acceptance.
Ai Siqiang said that their system is designed to further promote economies of scale by reducing the wafer edge exclusion zone and increasing the monolithic wafer usage of larger diameter substrates. The appeal of silicon carbide in this type of application stems from its unique materials, such as high critical electric field strength, which allows high breakdown voltage and low on-resistance. The greater advantage of silicon carbide in power applications is its high thermal conductivity and high heat resistance.
Ai Siqiang has developed a special reaction chamber for this state-of-the-art production system platform, which can withstand the high temperature of 1650 °C required for the epitaxial process of silicon carbide wafers. In the epitaxial process, each of the six 150 mm wafers processed by the Acetron system will undergo a "planetary" rotation, demonstrating the most advanced uniformity and repeatability of the technology.
The reason why Showa Denko chose Aisin hot wall silicon carbide chemical vapor deposition planetary system is to use Ai Siqiang's rich experience and expertise in this area, and expand its business scope through cost-effective 150mm silicon carbide wafers. . Showa Denko sees the rapid emergence of silicon carbide related products in the consumer electronics market and its future prospects in the railway power processing and automation market.
Various Puffs Vape Pen,Puff Vape Pen,Disposable Vapes,Vape Fume 2500
Lensen Electronics Co., Ltd , https://www.lensenvape.com